Evactron® Series Decontaminators and Cleaning Systems
The Evactron® Plasma Decontaminator™ is an RF plasma cleaner that reduces hydrocarbon contamination in vacuum chambers, improving electron microscope imaging and analytical performance. Evactron plasma cleaners can also be used as an in-situ solution for cleaning EUV and X-ray optics as well as SEM and TEM samples.
The Evactron Decontaminator plasma source can be rack mounted or installed on most vacuum chambers and electron microscopes. A wide range of products and connectors are available to best meet your needs.
See the ordering tables for recommendations based on your equipment. Flanges for common brands of equipment are available at the end of the page. If you do not see your brand listed, please contact us for additional options.
Applications
- Hydrocarbon removal in high vacuum chambers
- Clean SEMs and FIBs for better imaging
- Improve resolution contrast and scanning time
- Achieve pristine vacuum conditions
- Prepare specimens for artifact-free imaging
Evactron Model E50 Plasma Decontaminators
The Evactron E50 De-Contaminators are compact, high performance yet simplified plasma cleaners for Electron and Ion Beam Instruments such as SEMs, TEMs, and FIBs. The E50 delivers high power cleaning for superior resolution and imaging plus improved detector and probe sensitivity that are compromised by contamination. The compact design of the Evactron E50 Plasma Radical Source makes it a versatile solution for either SEM/FIB chambers, load locks, or sample prep chambers. The Evactron E50 Plasma Cleaners offer fast, effective, and powerful cleaning over a wide range of pressures enabling high quality, artifact free images and increased efficiency of sample analysis.
The compact design of the Evactron E-Series Plasma Radical Source makes it a versatile solution for either SEM/FIB chambers, load locks, or sample prep chambers. The Evactron E-Series Plasma Cleaners offer fast, effective, and gentle cleaning over a wide range of pressures enabling high quality, artifact free images and increased efficiency of sample analysis.
Features
- RF Power: 75W peak, 50W continuous
- Dual action cleaning using plasma and UV afterglow
- Energy efficient hollow cathode, capacitive coupled plasma (CCP)
- " Pop" ignition (patent pending) at high vacuum
- Programmable power, cleaning time, number of cycles, recipes
- Android tablet with Bluetooth communication
- Wide range pressure operation: 0.3 Pa/ 2 mTorr to 80 Pa/ 600 mTorr
- Optional external interlock connection
- TMP compatible, no advance venting needed
- Fast cleaning, 100X+ faster than earlier generation Evactron models
- Non-damaging to sensitive components–no sputter etch
- PRS can be installed on the SEM chamber or the load lock
- Push button cleaning operation
- No match or gas flow adjustments needed for plasma ignition
- TUV, NRTL and CE compliance testing pending
Available in two models: the Evactron E50 Plasma De-Contaminator and the Evactron E50-OEM Plasma De-Contaminator.
The Evactron E50 Plasma De-Contaminator was designed to remove hydrocarbon contamination from high vacuum chambers such as SEMs and FIBs. Its compact design fits most models of SEM and FIB chambers and loadlocks and comes in vertical and horizontal configurations.
The Evactron E50-OEM Plasma De-Contaminator was designed for OEM integration for SEM, FIB, high vacuum, and other analytical instruments. This simplified Evactron Plasma Radical Source (PRS) has a small footprint and utilizes air plasma afterglow to reduce hydrocarbon contamination, delivering results quickly and efficiently.
Specifications
| Evactron E50 | Evactron E50-OEM |
| Desktop controller with pushbutton operation | SEM/FIB host directed control |
| Android tablet with Bluetooth communication | 2U rack mount controller for system integration |
| Hardware interlock | Hardware interlock |
| Chassis dimensions (WxHxD): 17" x 3.4" x 6.7" (43 x 8.6 x 17 cm) |
Powerful compact Plasma Radical Source (PRS) |
| RF Power: 20-75 Watts at 13.56 MHz RFHC | RF Power: 20-75 Watts at 13.56 MHz RFHC |
| 100-240 VAC 50/60 Hz input | 100-240 VAC 50/60 Hz input |
| RoHS Compliant | RoHS Compliant |
Ordering Information
| 91000-01 | Evactron® E50 Plasma Decontaminator™ For Hitachi and JEOL Includes: Evactron E50 Desktop Controller Evactron E50 Cable Set (12.5" /3.8m) Evactron E50 Communications Package with Bluetooth GUI and Android tablet System user manual |
each | 22,603.00 | Add to Cart |
| 91000-02 | Evactron® E50 Plasma Decontaminator™ For FEI, Tescan and Zeiss Includes: Evactron E50 Desktop Controller Evactron E50 Cable Set (12.5" /3.8m) Evactron E50 Communications Package with Bluetooth GUI and Android tablet System user manual |
each | 22,603.00 | Add to Cart |
NEW! Evactron® E50 E-TC Plasma De-Contaminator
If your facility prefers a wired touchpad programming interface, the new Evactron E50 E-TC Plasma De-Contaminator is for you!
The touchpad has an RS-232 cable connecting it to the controller. Its simplified Plasma Radical Source utilizes air plasma and UV afterglow to reduce hydrocarbon contmination, delivering results quickly.
Features
- Desktop controller with pushbutton operation
- Tethered touchpad communication package
- Small Footprint
- Hardware interlock
- Chassis dimensions 44 x 8.9 x 22 cm
- Touchpad dimensions 134 x 112 x 69 mm
- RF Power: 20-75 watts at 13.56 MHZ RFHC
- 100-240 VAC 50/60 Hz input
| 91000-27 | Evactron E50 E-TC De-Contaminator System
for Hitachi and JEOL Includes: Evactron E50 E-TC Desktop Controller Evactron E50 E-TC Cable Set (24' 8"/7.5m) Evactron E50 E-TC Touchpad Interface System User Manual |
each | 22,160.00 | Add to Cart |
| 91000-28 | Evactron E50 E-TC De-Contaminator System
for FEI, Tescan and Zeiss Includes: Evactron E50 E-TC Desktop Controller Evactron E50 E-TC Cable Set (24' 8"/7.5m) Evactron E50 E-TC Touchpad Interface System User Manual |
each | 22,160.00 | Add to Cart |
Evactron® Model EP Plasma Decontaminators
The Evactron® E-Series™ of remote RF plasma cleaners reduces hydrocarbon contamination from high vacuum chambers by breaking down the carbon and turning it into a gas phase that is then removed by the pumping system.
Features
- High cleaning efficiency
- Small footprint/compact plasma radical source (PRS)
- Operates at TMP and turbomolecular pressures
- "Pop" ignition (patent pending)
- Windows and Android GUI software
- Desktop controller
- Fits chambers and load locks
- Vacuum safety interlock
The Evactron® EP Decontaminator is designed for:
- Cleaning high vacuum chambers, SEM/FIB
- Pre-cleaning of the samples
The Evactron® EP model with instant ignition from any vacuum level brings the user highest cleaning rates at low pressures. It uses flowing afterglow to remove surface hydrocarbons from vacuum chambers operating with turbo molecular pumps.
Technology
- Energy efficient hollow cathode plasma
- Flow through gas supply
- Plasma Radical Source (PRS) design maximizes delivery of radicals to chamber
- "Pop" ignition of the plasma works at pressures below 100 Pa/750 mTorr
- Low pressure operation 1-3 Pa/7.5-22.5 mTorr
- Starts and operates at turbo molecular pump compatible pressures
- Fixed match provides maximum plasma power transfer
Other Features
- High reliability at 20 Watts and 13.56 MHz power supply
- No vacuum gauge needed
- NW 40 flange standard, CF 2.75 optional
- Vacuum only operation interlock
- >100 Å/min cleaning rates
- Rack mount for system integration
- Elegant and compact design
- Windows GUI interface/Android tablet programming compatibility
Ordering Information
Attachment Flange required, sold separately. See below.
| 91000-11 | Evactron® EP Plasma Decontaminator™ + Android For Hitachi 8200 / 4800 Series SEM Includes: |
each | 19,000.00 | Add to Cart |
| 91000-12 | Evactron® EP Plasma Decontaminator™ + Android For JEOL TMP Systems Includes: |
each | 19,000.00 | Add to Cart |
| 91000-13 | Evactron® EP Plasma Decontaminator™ + Android For Zeiss Includes: |
each | 19,000.00 | Add to Cart |
NEW! Evactron® 20EP Plasma De-Contaminator
The Evactron 20EP De-Contaminator with Turbo plasma cleaning™ is a compact, high performance yet simplified plasma cleaner for Electron and Ion Beam Instruments such as SEMs, TEMs, and FIBs. The Evactron 20EP delivers cleaning with simplicity for higher resolution and contrast imaging plus improving detector and probe sensitivity that are compromised by hydrocarbon contamination.
The compact design of the Evactron 20EP Plasma Radical Source makes it a versatile solution for either SEM/FIB chambers, load locks, or sample prep chambers. The Evactron 20EP Plasma Cleaner offers fast, effective, and gentle cleaning over a wide range of pressures delivering high quality, artifact free images and increased efficiency of sample analysis.
Features
- Dual action cleaning using plasma and UV afterglow
- Energy efficient hollow cathode plasma radical source
- "Pop" ignition at high vacuum, classic operation at low vacuum
- Programmable power, cleaning time, number of cycles
- Compact desktop controller with display of cleaning recipes
- Fixed input air flow rate
- Chamber vacuum sensor and readout
- Wide range pressure operation: 100 Pa to 3 Pa or 0.75 Torr to 22 mTorr
- Fast cleaning, 60x faster than earlier generation Evactron models
- Non-damaging to sensitive components - no sputter etch
- Compact PRS can be installed on the SEM chamber or the load lock
- No manual match or gas flow adjustments needed for plasma ignition
- Operation log stored in memory
The Evactron 20EP Plasma De-Contaminator delivers classic and turbo plasma cleaning at low cost with simplified pressure and flow control, a stand alone control panel, and two ignition methods for easy starting.
Specifications
- Desktop controller with pushbutton operation
- Vacuum safety interlock and hardware interlock
- Compact EP plasma radical source (PRS)
- Chassis dimensions: W x H x D: 17" x 3.4" x 6.7" (43 x 8.6 x 17 cm)
- RF Power: 5-20 Watts at 13.56 MHz
- 100-240 VAC 50/60 Hz input
- CE/TUV/NRTL safety compliant
- RoHS Compliant
 |
 |
| Before Evactron Cleaning | After Evactron Cleaning |
Ordering Information
| 91000-09 | Evactron® 20EP Plasma Decontaminator | each | 16,200.00 | Add to Cart |
Evactron® Zephyr™ Plasma Decontaminators
The Evactron® Zephyr Decontaminator line was created to accommodate SEMs, FIBs, and other vacuum chambers that use turbo molecular pumps. They are designed for SEM/FIB systems and offer fast and efficient hydrocarbon removal with no damage to samples or sensitive components.
They offer users- Cleaning of SEM/FIB chambers at turbo pressure
- Shorter cleaning time (increased production, less downtime)
- One button operation
- Desktop controller
- SEM/FIB chambers or load locks
- 2 operating regimes
- Classic mode (roughing pressures)
- T-pump mode (turbomolecular pressures)
This easy to use tabletop model easily removes atmospheric hydrocarbons and carbon contamination from SEMs, FIBs, and other vacuum chambers.
The Evactron® Model 25 Zephyr Decontaminator uses a remote RF plasma to produce gas-phase radicals that flow downstream through the chamber eliminating contamination.
This model was created for chambers that use turbo molecular pumps (TMPs). It is designed to clean/de-contaminate in the turbo pressure regime at 1-50 mTorr and has no adverse effects on the TMP temperatures.
Features
- Clean chambers at turbo pump pressures
- 5-20 Watts RF power
- ≥10x improved cleaning rate
- One button operation
- 1-50 mTorr operating pressure
Benefits
- No stress to the turbo molecular pump
- Safely de-contaminates the chamber without damage to sensitive components
- Shorter cleaning time, giving increased production with less system down time
- Cleans chamber while in "pump down"
- Increased mean free path, yet ion damage free
Ordering Information
Attachment Flange required, sold separately. See below.
| 91000-10 | Evactron® 25 Zephyr Plasma Decontaminator Includes: |
each | 26,163.00 | Add to Cart |
Evactron® SoftClean™ System
Electron microscope image quality is greatly improved by the removal of hydrocarbon (H/C) contamination from microscope chambers and from specimen mounts, specimen holders, and the specimens themselves. The Evactron® Decontaminator was developed to clean microscope chambers of their residual H/C contamination.
The Evactron® SoftClean Chamber extends the ability to pre-clean specimens, specimen mounts, and holders with the proven downstream plasma ashing process before examination in the chamber, thus insuring high image quality. The Evactron® SoftClean Chamber can also be used as a specimen storage system, keeping samples in a clean environment.
The downstream plasma process used in the Evactron® SoftClean Chamber is gentle, yet very effective at removing H/C contamination. Sputter etching by other plasma cleaners can damage specimens through exposure to energetic ions and heat.
The Evactron® SoftClean Chamber uses reactive gas radicals to remove H/C from specimen surfaces by chemical etch, preserving critical sample fine structure. This downstream etching process breaks down problematic H/C residues into smaller molecules such as CO2, H2O and CO, which are easily pumped out of the chamber.
Specifications
- Cleans SEM/TEM samples
- Cleans TEM grids/sample rods
- Inert sample storage
- Just use air for oxygen radicals, or use other gases for alternative plasma processes
- Easy setup and operation. Preset pressure, power and time settings
- Can be operated from either front panel or computer interface
- Optional shroud can cover transducer and valve assembly on the Plasma Radical Source
- Start cleaning by using chamber vent and evacuation controls
- Advanced plasma detection logic
- Cleaning and error logs record history and aid troubleshooting
- Electronic chassis: 3.5"H x 19"W x 7"D (9 x 23 x 48 cm)
- RF Power: 5-20 Watts at 13.56 MHz
- KF 40 vacuum mounting flange, adapter flanges available
- 90-250 VAC 50/60 Hz input
- Shipping: 20 lb. (10 kg.)
Features
- Windows and Android GUI software
- Optional Safar side loaders (US 8,716,676 B2)
- Accommodates up to three TEM stage rods
Pump Specifications
- A dry scroll pump rated at 4 cfm/6.8 m3/h or better.
- A pump rated at ~8 cfm/13.5 m3/h is preferred.
- You may need to adapt The KF16 flange on the pump valve to a KF25 flange found on many roughing pumps.
- Use a roughing line of 2.5cm in diameter or larger.
Ordering Information
Attachment Flange required, sold separately. See below.
| 91000-15 | Evactron® SoftClean EP | each | 35,950.00 | Add to Cart |
| 91000-18 | (Optional) TEM Adapter for Jeol | each | 2,450.00 | Add to Cart |
| 91000-19 | (Optional) TEM Adapter for FEI | each | 2,450.00 | Add to Cart |
| 91000-20 | (Optional) TEM Adapter for Zeiss | each | 2,450.00 | Add to Cart |
| 91000-21 | (Optional) TEM Adapter for Hitachi | each | 2,450.00 | Add to Cart |
Evactron® CombiClean™ System
Decontaminate specimens and columns of SEMs and FIBs. The Evactron® CombiClean™ System combines onboard vacuum cleaning chamber and external PRS (Plasma Radical Source) control in one unified system.
- Cleans SEM/TEM samples and SEM chambers from one desktop controller
- Stores samples and parts after cleaning
- Uses patented Safar TEM side loaders
Innovative Design
Designed as a complete cleaning solution, the Evactron® CombiClean System features an integrated vacuum chamber for desktop cleaning samples and vacuum parts, as well as an external Plasma Radical Source (PRS) for Evactron® in-situ cleaning of E-beam instruments such as SEMs, FIBs, and other analytic instruments, by removing carbon contamination.
The system monitors operation of either PRS unit, has internal memory, and is designed for routine operation with minimal operator training. Onboard control allows for changing the cleaning modes between external and internal PRS with just the flip of a switch.
This system is compatible with rotary vane pumps without the worry of oil backstreaming. A dry nitrogen purge feature keeps specimens clean after a plasma cleaning, and a storage mode allows you to continue dry nitrogen purging a sample while the external PRS is in use.
Specifications
The system features a microprocessor with embedded software to regulate a leak valve and control the chamber pressure by a MicroPirani gauge.
The microprocessor also regulates the RF power, has a clock to time the downstream plasma cleaning and nitrogen purging cycles, and records the operational and fault log.
Cleaning with the Evactron® CombiClean System may be setup from either the front panel or a remote computer.
- VentDetect™ Technology
- Compatible with rotary vane pumps without the worry of oil backstreaming
- Dry Nitrogen purge feature keeps specimens clean after plasma cleaning
- Storage mode allows continued dry nitrogen purging of samples while external PRS is in use
- System monitors operation of either PRS unit
- Onboard control allows for cleaning modes between internal and external PRS with just the flip of a switch
- Wide Pressure Range
Pump Specifications
- A dry scroll pump rated at 4 cfm/6.8 m3/h or better.
- A pump rated at ~8 cfm/13.5 m3/h is preferred.
- You may need to adapt the KF16 flange on the pump valve to a KF25 flange found on many roughing pumps.
- Use a roughing line of 2.5cm in diameter or larger.
Ordering Information
Attachment Flange required, sold separately. See below.
| 91000-17 | Evactron® CombiClean™ System | each | 59,200.00 | Add to Cart |
| 91000-22 | (Optional) TEM Adapter for JEOL Sample Rod | each | 2,450.00 | Add to Cart |
| 91000-23 | (Optional) TEM Adapter for Hitachi Sample Rod | each | 2,450.00 | Add to Cart |
| 91000-24 | (Optional) TEM Adapter for FEI Sample Rod | each | 2,450.00 | Add to Cart |
| 91000-25 | (Optional) Evactron PRS-Z (shrouded, vertical configuration) | each | 13,100.00 | Add to Cart |
| 91000-26 | (Optional) Evactron Cable Bundle (22.5ft/6.0m) | each | 900.00 | Add to Cart |
Evactron® Adapter Flanges
Evactron® Flanges are identified by physical dimensions of the blank plate in the SEM/FIB. O Rings measured by inner diameter. All measurements in mm. Arranged by equipment brand to which flange commonly connects. Please contact Electron Microscopy Sciences for additional flanges.
| 230090-01 | FEI | 64 X 80, 50 ORID, 4H, OCTG, ASYM | each | 1,510.00 | Add to Cart |
| 230141-01 | FEI | 100 OD, 75 ORID, 6H | each | 1,510.00 | Add to Cart |
| 230142-01 | FEI | 100 OD, 72 ORID, 88 BC, 3H | each | 1,510.00 | Add to Cart |
| 230143-01 | FEI | 90 OD, 60 ORID, 78BC, 3H | each | 1,510.00 | Add to Cart |
| 230153-01 | FEI | 85 OD, 60 ORID, 76 BC, 3H | each | 1,510.00 | Add to Cart |
| 230154-01 | FEI | 100 OD, 70 ORID 84.5 BC, 3H | each | 1,510.00 | Add to Cart |
| 230155-01 | FEI | 64 OD, 38 ORID, 57 BC, 4H |
each | 1,510.00 | Add to Cart |
| 230235-01 | FEI | 70 OD, 33 ORID, 61 BC, 4H, PLUG, 1 PC. | each | 1,510.00 | Add to Cart |
| 230335-01 | FEI | 87 OD, 60 ORID, 74 BC, 3H | each | 1,510.00 | Add to Cart |
| 230350-01 | FEI | 120 OD, 93 ORID, 109 BC, 6H | each | 1,510.00 | Add to Cart |
| 230351-00 | FEI | 59 OD, 38 ORID, 52 BC, 4H, 1 PC. | each | 1,510.00 | Add to Cart |
| 230359-01 | FEI | 90 OD, 70 ORID, 80 BC, 3H | each | 1,510.00 | Add to Cart |
| 230006-01 | HITACHI | 57 OD, 34.5 ORID, 50 BC, 4H | each | 1,510.00 | Add to Cart |
| 230320-01 | HITACHI | 58 X 58, 24 ORID, 41.5 BC, 4H, PLUG, 1 PC. | each | 1,510.00 | Add to Cart |
| 230568-01 | HITACHI | 69 OD, 47.5 ORID, 4H | each | 1,510.00 | Add to Cart |
| 230001-01 | JEOL | 64 OD, 40 ORID, 55 BC, 4H | each | 1,510.00 | Add to Cart |
| 230002-01 | JEOL | 99 OD , 75 ORID, 89 BC, 4H, 38 (1.5") LONG NIPPLE | each | 1,510.00 | Add to Cart |
| 230002-02 | JEOL | 99 OD, 75 ORID, 89 BC, 4H, 64 (2.5") LONG NIPPLE | each | 1,510.00 | Add to Cart |
| 230003-01 | JEOL | 86 X 206, NO O-RING, 4H ASYM | each | 1,510.00 | Add to Cart |
| 230010-01 | JEOL | 73 OD, 50 ORID, 64 BC, 4H | each | 1,510.00 | Add to Cart |
| 230011-01 | JEOL | 74 X 90, OVAL O-RING, 4H, ASYM | each | 1,510.00 | Add to Cart |
| 230013-01 | JEOL | 88 OD, 45 ORID,79 BC, 4H, ASYM, 90 LONG NIPPLE | each | 1,510.00 | Add to Cart |
| 230022-01 | JEOL | 100 X 355, NO O-RING, 5H, ASYM | each | 1,510.00 | Add to Cart |
| 230023-01 | JEOL | 72 X 86, OVAL O-RING, 4H, ASYM | each | 1,510.00 | Add to Cart |
| 230311-01 | JEOL | 88 OD, 45 ORID, 79 BC, 4H, ASYM | each | 1,510.00 | Add to Cart |
| 230322-01 | JEOL | 75 X 98 (ARCHED, ONE SIDE), OVAL O-RING, 4H, ASYM | each | 1,510.00 | Add to Cart |
| 230325-01 | JEOL | 154 X 204, RECT O-RING, 4H, ASYM | each | 1,510.00 | Add to Cart |
| 230664-01 | JEOL | 95 OD, 71.5 ORID, 85.5 BC, 3H | each | 1,510.00 | Add to Cart |
| 230008-01 | ZEISS | 55 OD, 30 ORID, 45 BC, 4H | each | 1,510.00 | Add to Cart |
| 230012-01 | ZEISS | 64 X 64, 54 ORID, 57 BC, 4H | each | 1,510.00 | Add to Cart |
| 230014-01 | ZEISS | 79 OD, 53 ORID, 70.5 BC 4H | each | 1,510.00 | Add to Cart |
| 230015-01 | ZEISS | 84 OD, 54 ORID, 72 BC, 4H | each | 1,510.00 | Add to Cart |
| 230016-01 | ZEISS | 70 OD, 45 ORID, 57 BC, 4H | each | 1,510.00 | Add to Cart |
| 230017-01 | ZEISS | 113.5 OD, 46.5 ORID, 92 BC, 4H | each | 1,510.00 | Add to Cart |
| 230018-01 | ZEISS | 64 OD, 38 ORID, 57 BC, 4H | each | 1,510.00 | Add to Cart |
| 230020-01 | ZEISS | 82 OD, 41 ORID, 68 BC, 4H, PLUG | each | 1,510.00 | Add to Cart |
| 230034-01 | ZEISS | 96 OD, 72 ORID, 86 BC, 4H, ASYM | each | 1,510.00 | Add to Cart |
| 230036-01 | ZEISS | 62 X 62, 53 ORID, 71 BC, 4H | each | 1,510.00 | Add to Cart |
| 230037-01 | ZEISS | 162 OD, 127 ORID, 149 BC, 6H | each | 1,510.00 | Add to Cart |
| 230038-01 | ZEISS | 68 X 88, OVAL O-RING, 4H, SYMM | each | 1,510.00 | Add to Cart |
| 230039-01 | ZEISS | 89 X 89, 72 ORID, 92 BC, 4H | each | 1,510.00 | Add to Cart |
| 230356-01 | ZEISS | 100 OD, 60 ORID, 90 BC, 6H | each | 1,510.00 | Add to Cart |
| 230357-01 | ZEISS | 90 OD, 66 ORID, 81 BC, 4H, ASYM | each | 1,510.00 | Add to Cart |
| 230358-01 | ZEISS | 81 X 85, 4H, ASYM | each | 1,510.00 | Add to Cart |
| 230364-01 | ZEISS | 85 x 85, 70 ORID, 92 BC, 4H | each | 1,510.00 | Add to Cart |
| 230366-01 | ZEISS | 150 X 190, RECT. O-RING, 10H, ASYM | each | 1,510.00 | Add to Cart |
