Large Chamber Sputter Coaters

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EMS 300R T Triple Target, Large Chamber, Rotary-Pumped Sputter Coater

The EMS 300R T is a large chamber, rotary-pumped coating system ideally suited for sputtering a single large diameter specimen up to 8"/203 mm (e.g. a wafer), or multiple smaller specimens over a similar diameter.

The EMS 300R T is is suitable for sputtering non-oxidizing (noble) metals, e.g. gold (Au), gold/palladium (Au/Pd) and platinum (Pt). For oxidizing metals see the EMS 300T T Plus and EMS 300T D Plus.

Key Features

• Large area sputter coating – up to 8"/200 mm diameter
• Triple sputtering head – ensures even coating deposition of large specimens
• Single target selection – for economic coating of small specimens
• Sputtering of a range of non-oxidizing (noble) metals – such as gold (Au), platinum (Pt) and silver (Ag). For oxidizing metals see the EMS 300T T Plus and EMS 300T D Plus
• Precise thickness control using the film thickness monitor option
• Fully automatic touch screen control – rapid data input, simple operation
• Easy-to-change, drop-in style specimen stages (rotation stage as standard)
• Thick film capabilities – up to 60 minutes sputtering time without breaking vacuum
• Three-year warranty

Product Description

Ideal for sputter coating large SEM specimens

The EMS 300R T is suited for sputtering noble metals, such a gold (Au) and platinum (Pt), for scanning electron microscopy (SEM) and thin film applications.

The EMS 300R T is fitted with three individual sputtering heads to ensure even deposition of individual large specimens or multiple smaller specimens. For economical coating of small specimens, 'single target' mode can be selected.

Note: It is not possible to sequentially sputter three different sputtering metals from each sputtering head – for sequential coating see the EMS 300T D Plus Dual Target Sequential Sputtering System.

Molded case with color touch screen

The EMS 300R T is presented in a custom molded, one-piece case, allowing easy servicing access. The embedded color touch screen allows multiple users to input and store coating 'recipes'. The case houses all the working components, including automatic bleed control that ensures optimum vacuum conditions during sputtering.

The vacuum chamber has an internal diameter of 283 mm/12" and comes with an integral implosion guard. The EMS 300R T also includes 'vacuum shutdown', a useful feature which enhances vacuum performance by allowing the chamber vacuum to be maintained when the system is not in use.

A variable-speed rotary specimen stage is fitted as standard and is suitable for 8"/200 mm and 6"/150 mm wafers. For other stages, see Ordering Information.

Rapid data entry

At the operational heart of the EMS 300R T is a simple color touch screen, which allows even the most inexperienced or occasional operator to rapidly enter and store their own process data. To further aid ease of use, a number of typical sputtering and carbon coating profiles are already stored. For added convenience, summaries of the last 100 coatings carried out can be viewed.

Maintenance

The touch screen interface features maintenance prompts that highlight time of last clean, coating time since last cleaned, system 'on time' and time of last service.

Pumping requirement

A suitable rotary vacuum pump is required. The Pfeiffer DUO 6 5m³/hr two-stage rotary vacuum pump (91003) is ideal for this purpose. Dry pumping alternatives are also available. See Ordering Information for more details.

Additional Information

Options and Accessories (including details ofthe standard specimen stage)

Specimen stages

Rotation stage: 50 mm Ø. There is no tilt or height adjustment – only rotation.

Rotate-tilt stage: 50 mm Ø with height adjustment (target-to-stage height variable between 30-80 mm). The tilt angle can be preset (horizontal to 30°).

Rotation stage for glass microscope slides.

Other options

Extended height chamber for taller specimens

Film Thickness Monitor (6555). Consists of a controller and quartz crystal oscillator built into the EMS 300R T, plus a vacuum feed-through, chamber-mounted crystal holder and quartz crystal. Cannot be used when the coater is operated in 'single target' mode.

Specifications

Instrument case	585 mm W x 470 mm D x 410 mm H, total height with coating head open is 650 mm
Weight	36.4 kg
Packed dimensions	725 mm W x 660 mm D x 680 mm H (44.8 kg)
Work chamber	Borosilicate glass 283 mm ID x 127 mm H
Safety shield	Integral polyethylene terephthalate (PET) cylinder
Display	145 mm x 320 mm x 240 mm color graphic thin film transistor (TFT)
User interface	Intuitive full graphical interface with touch screen buttons, includes features such as a log of the last 100 coatings carried out and reminders for when maintenance is due
Sputter targets	Disc-style 57 mm Ø with thick depending upon the targets fitted. Three 57 mm Ø x 0.3 mm thick gold (Au) targets are fitted as standard
Vacuum pump	5m3/hr Pfeiffer DUO 6 two-stage rotary pump with oil mist filter (Order separately: 91003)
Vacuum measurement	Pirani gauge
Typical ultimate vacuum	2 x 10-2 mbar in a clean system after pre-pumping with dry nitrogen gas
Specimen stage	Flat rotation stage for 8"/200 mm and 6"/150 mm wafers fitted as standard. Rotation speed is variable between preset limits. For alternative stages, see Ordering Information

Processes

Sputtering

0-80 mA to a pre-determined thickness determined by the built-in timer or optional film thickness monitor. The maximum sputtering time is 60 minutes (without 'breaking' vacuum and with built-in rest periods).

Services and other information

Gases	Argon sputtering process gas, 99.999% Nitrogen venting gas (optional)
Electrical supply	90-250V 50/60Hz 1,400VA including RV3 rotary pump
Conformity	Power factor correction. Complies with the current legislation (CE Certification) and ensures efficient use of power, resulting in reduced running costs

Ordering Information

EMS 300R T	Large-Chamber-Rotary-Pumped Sputter Coater, fitted with three sputtering heads to ensure even metaldeposition. Include three 57 mm Ø x 0.3 mm gold (Au) sputter targets. A flat rotation stage for 8"/203 mm/and 6"/152 mm wafers is fitted as standard	POR	Quote
91005	Rotary pump requirements (needs to be ordered separately) Edwards RV5 90L/s two-stage rotary pump, with vacuum hose, coupling kit and oil mist filter	2,900.00	Add to Cart

Specimen Stages

6400-S	Rotating 50 mm Ø specimen stage with adjustable tilt. The platform has six specimen stub positions for 6.5 mm, 10 mm and 15 mm or ⅛" pin stubs. Stage rotation speed is variable between preset limits. No rotation is possible when in single target mode. Target to stage height is variable between 0 mm and 42 mm for the standard stage. When used with the extended height cylinder (optional accessory 10596) the target to stage height would be an additional 87 mm	POR	Quote
6401	50 mm Ø variable height specimen stage with six stub positions for, 6.5 mm 10 mm and 15 mm disc stubs or ⅛" pin stubs. Stage rotation speed is variable between preset limits	POR	Quote
6402	50 mm Ø rotary tilting stage. A rotary planetary style stage with variable tilt angle from horizontal to 30 degrees. The platform has six positions for either 6.5 mm 10 mm and 15 mm disc stubs or ⅛" pin stubs. Rotation speed is variable between preset limits. Note: depending upon specimen height, this stage may require the optional extended height cylinder	POR	Quote
6403	A 90 mm Ø specimen stage for glass microscope slides (up to two x 75 mm x 25 mm slides or a single 75 mm x 50 mm slide). The stage can alternatively accommodate up to six ⅛" SEM pins stub. Stage rotation speed variable between preset limits. Includes a gear box to allow the optional FTM to be used	POR	Quote

Options and Accessories

6404	Film thickness monitor (FTM) attachment. Including oscillator, feed-through, quartz crystal holder and one quartz crystal	POR	Quote
6405	Spare quartz crystal	95.00	Quote
6406	Extended height vacuum chamber (214 mm in height – the standard chamber is 127 mm high). For increased source to specimen distance and for coating larger specimens	POR	Quote
6407	Vacuum spigot allows more convenient connection of the vacuum hose to the rear of the EMS 300R T when bench depth is limited	POR	Quote
6408	A lockable emergency stop (e-stop) switch which can be mounted on top of the system in a position easily accessible for the operator. It is provided with a key to release the knob after activation. Note: the addition of the e-stop does not inhibit or replace the normal On/Off switch function. The e-stop can be retrofitted to existing systems	POR	Quote
6409	Coating shields. Shields can be fitted to protect large surfaces from coating deposition, easily removable for ease of cleaning	POR	Quote
6410	Two-year spares kit for EMS 300R T. Includes: 3 x 57 mm Ø x 0.3 mm gold (Au) target, standard glass chamber assembly, O-rings etc.	POR	Quote
6411	6" Wafer Specimen Stage: A flat adjustable stage capable of accepting 6" or 101.6 mm wafers	POR	Quote
6412	4" Wafer Stage: A flat 4 ½" 102 mm flat, drop in wafer stage which accepts 2, 3, 4" Wafers	POR	Quote
6413	Additional Standard Glass Cylinder Assembly	POR	Quote

Sputter targets

The EMS 300R T is fitted as standard with three 0.3 mm thick gold (Au) targets . Other optional targets are available (three required):

4523	57 mm Ø x 0.1 mm Gold	POR	Quote
4524	57 mm Ø x 0.2 mm Gold	POR	Quote
4525	57 mm Ø x 0.3 mm Gold	POR	Quote
4526	57 mm Ø x 0.1 mm Gold/Palladium (80/20)	POR	Quote
4527	57 mm Ø x 0.2 mm Gold/Palladium (80/20)	POR	Quote
4528	57 mm Ø x 0.3 mm Gold/Palladium (80/20)	POR	Quote
4529	57 mm Ø x 0.1 mm Platinum	POR	Quote
4530	57 mm Ø x 0.2 mm Platinum	POR	Quote
4531	57 mm Ø x 0.3 mm Platinum	POR	Quote
4532	57 mm Ø x 0.1 mm Nickel	POR	Quote
4533	57 mm Ø x 0.1 mm Silver	POR	Quote
4534	57 mm Ø x 0.1 mm Palladium	POR	Quote
4535	57 mm Ø x 0.1 mm Copper	POR	Quote
4536	57 mm Ø x 0.1 mm Platinum/Palladium (80/20)	POR	Quote
4537	57 mm Ø x 0.3 mm Platinum/Palladium (80/20)	POR	Quote

EMS 300T T Plus Triple Target, Large Chamber, Turbo-Pumped Sputter Coater

The EMS 300T T Plus is a large chamber, turbo-pumped coating system, ideally suited for sputtering a single large diameter specimen up to 8"/200 mm or multiple smaller specimens over a similar diameter. Ideal for thin-film applications and SEM/FE-SEM. It is fitted with three sputtering heads to ensure even deposition of individual large specimens or multiple specimens.

NB: Please note it is not possible to sequentially sputter three different sputtering metals from each sputtering head – for sequential coating see the EMS 300T D Plus.

Key Features

• Ultimate vacuum of 1x10^-6 mbar or less possible
• New touch and swipe capacitive screen
• USB port for upgrades and download of process log files
• Multiple-use profiles can be set up on one machine
• New software sorts recipes per user according to recent use
• 16GB of memory can store more than 1000 recipes
• New multi-color LED visual status indicator
• Interchangeable stage options
• Three sputter heads for larger area deposition of different materials

Recommended applications for EMS 300T T Plus

• Wafer Inspection
• Multiple sample preparation for SEM

These products are for Research Use Only.

Detachable chamber with built-in implosion guard

Removable glass chamber and easily accessible base and top plate allows for an easy cleaning process. Users can rapidly change the chamber, if necessary, to avoid cross contamination of sensitive samples. Tall chamber option is available for improved uniformity for sputtering and to hold larger substrates.

Triple Target Sputtering System

The EMS 300T T Plus is fitted with three individual sputtering heads to ensure even deposition of individual large specimens or multiple specimens. For economical coating of small specimens, 'single target' mode can be selected. They are ideal coaters for the preparation of large specimens for examination by SEM, FEG-SEM. To ensure even deposition, the EMS 300T T Plus coaters are fitted with a rotating specimen stage and three individual magnetron target assemblies, which enhance the efficiency of the process by using low voltages.

Multiple stage options

The EMS 300T T Plus has specimen stages to meet most requirements. All are easy-change, drop-in style (no screws) and the rotation speed is variable between pre-set limits. Flat rotation stage for 200 mm/8" and 150 mm/6" wafers (fitted as standard).

Safety

The EMS 300T T Plus meets key industry CE standards

• All electronic components are protected by covers
• Implosion guard prevents user injury in event of chamber failure
• Vacuum interlocks remove power from deposition sources to prevent user exposure to high voltage in event of chamber being opened
• Overheating protection shuts down power supply

Vacuum control

High vacuum turbo pumping allows sputtering of a wide range of oxidizing and non-oxidizing metals for thin film and electron microscopy applications. Automatic vacuum control which can be pre-programmed to suit the process and material, therefore removing the need for manual intervention or control.

Cool magnetron sputtering

Sputter coating is a technique widely used in various applications; it is possible to create a plasma and sputter metals with high voltage, poor vacuum and no automation. However, this is not suitable for electron microscopy applications because it can heat the sample and result in damage when the plasma interacts with the sample. The EMS 300T T Plus uses low temperature enhanced-plasma magnetrons optimized for the turbomolecular pump pressures, combined with low current and deposition control, which ensures your sample is protected and uniformly coated.

The EMS 300T T Plus uses easy-change, 57 mm diameter, disc-style targets which are designed to sputter oxidizing and noble metals. The EMS 300T T Plus is fitted as standard with a chromium (Cr) sputter target. Other targets options include; Au, Au/Pd, Pt/Pd, Pd, Pt, Cu, Ir, W, ITO and Al, etc.

Pulsed cleaning for Aluminum sputtering

Aluminum (Al) rapidly forms an oxide layer which can be difficult to remove. The EMS 300T T Plus has a special recipe for Aluminum that reduces the oxide removal time and prevents excessive pre-sputtering of the target.

Film thickness monitor

The EMS 300T T Plus can be fitted with an optional film thickness monitor (FTM), which measures the coating thickness on a quartz crystal monitor within the chamber, in order to control the coating thickness of material deposited on to the sample.

Specifications

Instrument case	590 mm W x 535 mm D x 420 mm H, total height with coating head open is 772 mm
Weight	36 kg (Packed 59 kg)
Packed dimensions	730 mm W x 630 mm D x 690 mm H
Work chamber	Borosilicate glass 300 mm OD x 127 mm H
Safety shield	Integral polyethylene terephthalate (PET) cylinder
Display	115.5 mm W x 86.4 mm H (active area), 640 RGB x 480 (display format), capacitive touch color display
User interface	Full graphical interface with touch screen buttons, includes features such as a log of the last 1000 coatings and reminders for when maintenance is due
Specimen stage	A flat rotation stage for 6" (150 mm) and 8" (200 mm) wafers is fitted as standard. A rotating/tilt stage and the 'rota cota' rotary tilt stage are also options

Vacuum

Rotary pump	4m3/hr two-stage rotary pump with oil mist filter for the EMS 300T T Plus
Turbo pump	Internally mounted 70 L/s air-cooled
Vacuum measurement	Pirani gauge as standard, full range gauge available as an option
Ultimate Vacuum	5 x 10-5 mbar Typical ultimate vacuum of the pumping system in a clean instrument after pre-pumping and venting with dry nitrogen gas
Sputter vacuum range	5 x 10-2 mbar to 5 x 10-3 mbar Typical ultimate vacuum of the pumping system in a clean instrument after pre-pumping and venting with dry nitrogen gas

Processes

Sputter Deposition Current

Single target: 1 – 140mA All targets: 60 – 420mA

Services

Gases

Process gas argon, 99.999% Nominal 5 psi

Visual status indicator

A large multi-color status indicator light provides a visual indication of the state of the equipment, allowing users to easily identify the status of a progress at a distance.

The indicator LED shows the following states:

• Initialization
• Process running
• Idle
• Coating in progress
• Process completed
• Process ended in fault condition

Audio indication also sounds on completion of the process.

Ordering Information

EMS 300T T Plus

Triple Target, Large Chamber, Turbo-Pumped Sputter Coater, fitted with three sputtering heads to ensure even metal deposition. Includes three 57 mm Ø x 0.3 mm chromium (Cr) sputter targets. A flat rotation stage for 200 mm/8" and 150 mm/6" wafers is fitted as standard.

POR

Quote

Rotary pump requirements (needs to be ordered separately)

91003	Edwards RV3 50L/s two-stage rotary pump, with vacuum hose, coupling kit and oil mist filter	2,600.00	Add to Cart
6548	XDS 5 Scroll Pump	POR	Quote
6550-A	Diaphragm pump. A "dry" alternative to the standard 91003 oil-based rotary pump complete with vacuum hose, coupling kit and oil mist filter	POR	Quote

Specimen stages

6551	Rotating 50 mm Ø specimen stage with adjustable tilt. The platform has six specimen stub positions for 15 mm, 10 mm, 6.5 mm or ⅛" pin stubs. Stage rotation speed is variable between preset limits. No rotation when in single target mode. Target to stage height is variable between zero and 42 mm for the standard stage. When used with the extended height cylinder (optional accessory) the target to stage height would be an additional 87 mm	POR	Quote
6552	50 mm Ø variable height specimen stage with six stub positions for 15 mm, 10 mm, 6.5 mm disc stubs or ⅛" pin stubs. Stage rotation speed variable between preset limits	POR	Quote
6553	50 mm Ø "Rotacota" stage. A rotary planetary style stage with variable tilt angle from horizontal to 30 degrees. The platform has six positions for either, 6.5 mm, 10 mm, 15 mm disc stubs, or ⅛" pin stubs. Rotation speed is variable between preset limits. Note: depending upon specimen height, this stage may require the optional extended height cylinder	POR	Quote
6554	A 90 mm Ø specimen stage for glass microscope slides (up to two 75 mm x 25 mm slides or a single 75 mm x 50 mm slide). The stage can alternatively accommodate up to six ⅛" SEM pins stub. Stage rotation speed is variable between preset limits. Includes gear box to allow optional FTM to be used.	POR	Quote
6547	6" Wafer Specimen Stage: A flat adjustable stage capable of accepting 6" or 101.6 mm wafers	POR	Quote
6549	A 4" 102 mm flat drop-in-wafer stage which accepts 2", 3", and 4" wafers	POR	Quote

Options and Accessories

6555	Film thickness monitor (FTM) attachment. Including oscillator, feed-through, quartz crystal holder and one quartz crystal	POR	Quote
6556	Spare quartz crystal	95.00	Add to Cart
6557	Extended height vacuum chamber (214 mm in height – the standard chamber is 127 mm high). For increased source to specimen distance and for coating large specimens	POR	Quote
6558	A lockable emergency stop (e-stop) switch which can be mounted on top of the system in a position easily accessible for the operator. It is provided with a key to release the knob after activation. Note: the addition of the e-stop does not inhibit or replace the normal On/Off switch function. The e-stop can be retrofitted to existing systems	POR	Quote
6559	Coating shields. Shields can be fitted to protect large surfaces from coating deposition – easily removable for ease of cleaning	POR	Quote
6560-A	Vacuum spigot allows more convenient connection of the vacuum hose to the rear of the EMS 300T T Plus when bench depth is limited	POR	Quote
6561	Full range, active vacuum gauge capable of measurement over the range of 1000 mbar to 5 x 10-9 mbar. Typical ultimate vacuum of system is 5 x 10-5 mbar. Note: gauge must be factory fitted	POR	Quote
6562	Spares kit, including: spare standard glass cylinder, three 3417 chromium (Cr) sputtering targets, vacuum tubing with coupling insert, argon gas tubing, three sputter head magnets, rotary pump oil mist filter and fuses	POR	Quote

Sputter targets

Note: The EMS 300T T Plus is fitted as standard with three 0.3 mm chromium (Cr) targets (3417). Other optional targets are available (three required):

3410	57 mm Ø x 0.1 mm Gold	POR	Quote
3410-2	57 mm Ø x 0.2 mm Gold	POR	Quote
3411	57 mm Ø x 0.1 mm Gold/Palladium (80/20)	POR	Quote
3411-2	57 mm Ø x 0.2 mm Gold/Palladium (80/20)	POR	Quote
3412	57 mm Ø x 0.1 mm Platinum	POR	Quote
3412-2	57 mm Ø x 0.2 mm Platinum	POR	Quote
3413	57 mm Ø x 0.1 mm Nickel	POR	Quote
3414	57 mm Ø x 0.1 mm Silver	POR	Quote
3415	57 mm Ø x 0.1 mm Palladium	POR	Quote
3416	57 mm Ø x 0.1 mm Copper	POR	Quote
3417	57 mm Ø x 0.3 mm Chromium	POR	Quote
3418	57 mm Ø x 0.5 mm Tungsten	POR	Quote
3419	57 mm Ø x 1.5 mm Chromium	POR	Quote
3420	57 mm Ø x 0.2 mm Tungsten	POR	Quote
3421	54 mm Ø x 1.5 mm Carbon	POR	Quote
3422	57 mm Ø x 0.1 mm Aluminum	POR	Quote
3423	57 mm Ø x 0.1 mm Platinum/Palladium (80/20)	POR	Quote
3424	57 mm Ø x 1.5 mm Titanium	POR	Quote
3425	57 mm Ø x 0.3 mm Platinum/Palladium (80/20)	POR	Quote
3426	57 mm Ø x 0.3 mm Gold	POR	Quote
3427	57 mm Ø x 0.3 mm Gold/Palladium (80/20)	POR	Quote
3428	57 mm Ø x 0.3 mm Platinum	POR	Quote
3429	57 mm Ø x 0.5 mm Titanium	POR	Quote
3430	57 mm Ø x 0.1 mm Iron	POR	Quote
3431	57 mm Ø x 0.3 mm Iridium	POR	Quote
3432	57 mm Ø x 0.1 mm Cobalt	POR	Quote
3433	57 mm Ø x 0.1 mm Tin	POR	Quote
3434	57 mm Ø x 0.1 mm Molybdenum	POR	Quote
3435	57 mm Ø x 0.3 mm Magnesium	POR	Quote
3435-5	57 mm Ø x 0.5 mm Magnesium	POR	Quote
3436	57 mm Ø x 0.1 mm Tantalum	POR	Quote
3437	57 mm Ø x 3 mm Indium Tin Oxide (90/10)	POR	Quote

EMS 300T ES Large Chamber Turbo-Pumped Evaporator/Sputter Coater

The EMS 300T ES is a large chamber, turbomolecular-pumped coating system ideally suited to metal evaporation onto large diameter specimens up to 6"/152 mm (for example a wafer) or smaller multiple specimens. The EMS 300T ES also comes with interchangeable sputtering and carbon evaporation inserts to allow a coating radius of up to 4"/102 mm.

Key Features

• Metal evaporation, carbon evaporation and metal sputtering – in one space saving design
• Larger area metal evaporation – up to 6"/152 mm
• Larger area sputter/carbon coating – up to 4"/102 mm diameter
• High vacuum sputtering – oxidizing and non-oxidizing (noble) metals: suitable for SEM, high resolution FE-SEM and many thin film applications
• High vacuum carbon coater – ideal for SEM and TEM carbon coating
• Controlled, ramped carbon rod evaporation – precise control of carbon thickness. Non-sparking process gives superior quality films
• Up to 60 minutes sputtering time – thick films capabilities
• Three-Year Warranty

The EMS 300T ES is a large chamber, turbomolecular-pumped coating system ideally suited to metal evaporation onto large diameter specimens up to 6"/152 mm (for example a wafer) or smaller multiple specimens. The EMS 300T ES also comes with interchangeable sputtering and carbon evaporation inserts to allow a coating radius of up to 4"/102 mm.

The sputter coating insert will deposit both oxidizing metals, e.g. chromium and Aluminum and non-oxidizing (noble) metals such as gold and platinum. A chromium (Cr) target is fitted as standard.

The EMS 300T ES has a full range of optional accessories, including specimen stages and film thickness measurement which means the system can be tailored to the precise requirements of the user.

Thermal evaporation of metals

The EMS 300T ES allows controlled thermal evaporation of metals onto large substrates (up to 6"/152 mm). For many evaporative processes, tungsten filaments supplied with the system are used. However, some metals require the use of a molybdenum boat, which can also be used for heat-cleaning SEM and TEM apertures.

The evaporation head is normally positioned for downwards evaporation, but for small specimens upward evaporation is possible using two terminal extensions supplied with the system.

Sputter coating for high resolution FE-SEM and thin film applications

The advance design of sputtering head, power supply and system control allows sputtering of both oxidizing and non-oxidizing (noble) metals for thin film applications and for scanning electron microscopy (SEM) coating. The full range of target materials available is extensive and detailed in the Ordering Information section.

For sputtering applications where thick films are required, then the EMS 300T ES can operate for up to 60 minutes.

High vacuum carbon evaporation for SEM and TEM

The carbon rod evaporation insert allows high quality carbon films to be deposited over a radius of up to 4"/102 mm.

The EMS 300T ES uses controlled ramped carbon rod evaporation to ensure optimum control of the process and quality of results (with or without the optional film thickness measurement system). In addition the quality of the resulting carbon films is enhanced by the eradication of "sparking" which is a common problem with less advanced coating systems.

High vacuum turbomolecular pumping and vacuum measurement

The EMS 300T ES is fitted with an internally mounted 70 L/s turbomolecular pump backed by a 5m³ hr two-stage rotary pump (order separately). A full range vacuum measurement gauge is included. Typically ultimate vacuums of around 5 x 10^-5 mbar can be expected in a clean system after pre-pumping with dry nitrogen gas. For details of pumping options, see Ordering Information.

Touch-screen control and stored recipes

At the operational heart of the EMS 300T ES is a color touch screen which allows users to rapidly enter and store their own process data. A range of typical sputtering and evaporation profiles are pre-installed. The EMS 300T ES uses an 'Intelligent' recognition system that automatically detects the type of coating insert fitted and "becomes" either an evaporator, carbon coater or sputter coater.

Vacuum chamber and specimen stages

The EMS 300T ES is presented in a custom-molded, one-piece case allowing easy servicing access. The case houses all the working components and includes an automatic bleed control that ensures optimum vacuum conditions during sputtering.

The vacuum chamber has an internal diameter of 283 mm/11" and comes with an integral safety guard. The vacuum shutdown option enhances vacuum performance by allowing the chamber vacuum to be maintained when the coater is not in use.

A variable speed rotary specimen stage is fitted as standard and accommodates specimens up to 4"/100 mm in diameter. For details of other stages, see Ordering Information.

Pumping Requirement

A suitable rotary vacuum pump is required. The Pfeiffer DUO 6 5m³/hr two-stage rotary vacuum pump (91003) is ideal for this purpose. Dry pumping alternatives are also available. See Ordering Information for more details.

Options and Accessories

Specimen stages and holders

The EMS 300T ES has additional specimen stages to meet most requirements. All are easy-change, drop-in style (no screws) and are height adjustable (except for the rotary planetary stage). Rotation speeds are variable between preset limits.

• Rotation stage for 4" wafers (supplied with system)
• Rotation stage for 6" wafers
• Flat rotation stage for SEM specimen stubs
• Rotation stage with preset tilt for SEM specimen stubs
• Rotate-tilt (rotary-planetary style) stage
• Rotation stage for glass microscope slides
• Eight-place stage for 25 mm or 30 mm embedded polished specimens
• "Sun and planets" style rotary stage; Three platforms, each 92 mm Ø
• Microscope coverslip stage for nine 20 mm x 20 mm coverslips
• TEM grid holder

Other options

• Extended height chamber (supplied with the EMS 300T ES)
• Standard height chamber
• Film thickness monitor (FTM)
• Conductance film monitor (CFM)

Specifications

Dimensions	585 mm W x 470 mm D x 410 mm H, total height with coating head open is 710 mm
Weight	37 kg
Packed dimensions	725 mm W x 660 mm D x 680 mm H (45 kg)
Work chamber	Borosilicate glass 283 mm ID x 215 mm H
User interface	Intuitive full graphical interface with touch-screen menus and buttons
Sputter target	Disc-style 57 mm Ø with thickness depending upon the target fitted. One 0.3 mm thick chromium (Cr) target (3417) is fitted as standard
Pumping	Internally-mounted 70 L/s turbomolecular pump
Rotary pump	5m3 hr two-stage rotary pump with oil mist filter. (Order separately: see 91003). Dry pumping option available.
Typical ultimate vacuum	5 x 10-5 mbar in a clean system after pre-pumping with dry nitrogen gas. Measurement using a full range Penning gauge
Specimen stage	Stage for 4" wafer supplied as standard. For alternative stages, see Ordering Information

Services and other Information

Gases	Argon sputtering process gas, 99.999%. Nitrogen venting gas (optional)
Electrical supply	90-250 V 50/60 Hz 1,400 VA including rotary pump, 110/240 V voltage selectable

Ordering Information

EMS 300T ES

Turbomolecular-pumped sputtering, metal evaporation and carbon coating system with 300 mm Ø x 215 H mm work chamber. Consists of high quick release sputter insert with a 3417 57 mm Ø x 0.3 mm chromium (Cr) target. High vacuum carbon rod evaporation coater and metal evaporation head. Coating inserts are interchangeable. A 4" wafer stage supplied as standard. Integrated full range gauge assembly for high vacuum measurement.

POR

Quote

Rotary pump requirements – order separately

Pumps supplied with vacuum hose and coupling kit

91003	5m3 hr two-stage Pfeiffer Duo 6 rotary pump with oil mist filter	2,600.00	Add to Cart
6550-A	Diaphragm pump. A "dry" alternative to the standard 91003 oil-based rotary pump	POR	Quote
6548	Edwards nXDS6i scroll pump. Lubricant-free and hermetically sealed, giving totally clean and dry vacuum to prevent cross-contamination	POR	Quote

Options and Accessories – specimen stages

Rotation stages rotation speed variable between preset limits

6551	Rotating 50 mm Ø specimen stage with adjustable tilt. The platform has six specimen stub positions for 15 mm, 10 mm, 6.5 mm or ⅛" pin stubs. Stage rotation speed is variable between preset limits. No rotation when in single target mode. Target to stage height is variable between zero and 42 mm for the standard stage. When used with the extended height cylinder (optional accessory 10596) the target to stage height would be an additional 87 mm	POR	Quote
6552	50 mm Ø variable height specimen stage with six stub positions for 15 mm, 10 mm, 6.5 mm disc stubs or ⅛" pin stubs. Stage rotation speed variable between preset limits	POR	Quote
6553	50 mm Ø rotary tilting stage. A rotary planetary style stage with variable tilt angle from horizontal to 30 degrees. The platform has six positions for either, 6.5 mm, 10 mm, 15 mm disc stubs, or ⅛" pin stubs. Rotation speed is variable between preset limits. Note: depending upon specimen height, this stage may require the optional extended height cylinder	POR	Quote
6554	A 90 mm Ø specimen stage for glass microscope slides (up to two 75 mm x 25 mm slides or a single 75 mm x 50 mm slide). The stage can alternatively accommodate up to six ⅛" SEM pins stub. Stage rotation speed is variable between preset limits. Includes gear box to allow optional FTM to be used.	POR	Quote
6547-SP	Rotation stage for 4" or 6" wafers	POR	Quote
6513	Sun and planet-style rotation stage (each stage is 92 mm Ø)	POR	Quote
6549	Eight-place stage for 25 or 30 mm embedded, polished specimens	POR	Quote
6512	Nine-place TEM grid holder	POR	Quote

Other Options and Accessories

6555	Film thickness monitor (FTM) attachment. Including oscillator, feed-through, quartz crystal holder and one quartz crystal	POR	Quote
6556	Spare quartz crystal for FTM	95.00	Add to Cart
6555-SP	Conductance film monitor (CFM) attachment including housing, feedthrough, glass slides and cable. A factory fitted only option for monitoring sheet resistance of evaporated films allowing termination at a known resistance	POR	Quote
6557	Extended height glass cylinder, 300 mm Ø x 215 mm high (supplied as standard)	POR	Quote
6557-10	Standard height glass cylinder, 300 mm Ø x 127 mm high	POR	Quote
6558	A lockable emergency stop (e-stop) switch mounted on top of the system for easy access	POR	Quote
6559	Coating shields. Can be fitted to protect large surfaces in the chamber from coating deposition – easily removable for ease of cleaning	POR	Quote
6560-A	Vacuum spigot allows a more convenient connection of the vacuum hose to the rear of the EMS 300T ES when bench depth is limited	POR	Quote

Evaporation Supplies

73830-SP	Tungsten wire baskets – pack of 10	POR	Quote
73810-SP	Molybdenum boats – pack of 10	POR	Quote

Sputter Targets

All targets are 57 mm in diameter – thicknesses vary. The EMS 300T ES is fitted as standard with one 57 mm x 0.3 mm chromium (Cr) target. Other optional targets are available:

3410	Gold (Au) 0.1 mm	POR	Quote
4524	Gold (Au) 0.2 mm	POR	Quote
3411	Gold/palladium (Au/Pd) 0.1 mm	POR	Quote
4527	Gold/palladium (Au/Pd) 0.2 mm	POR	Quote
3412	Platinum (Pt) 0.1 mm	POR	Quote
4530	Platinum (Pt) 0.2 mm	POR	Quote
3413	Nickel (Ni) 0.1 mm	POR	Quote
3414	Silver (Ag) 0.1 mm	POR	Quote
3415	Palladium (Pd) 0.1 mm	POR	Quote
3416	Copper (Cu) 0.1 mm	POR	Quote
3538	Aluminum (Al) 1.0 mm	POR	Quote
3421	Carbon (C) 1.5 mm	POR	Quote
3417	Chromium (Cr) 0.3 mm	POR	Quote
3419	Chromium (Cr) 1.5 mm	POR	Quote
3432	Cobalt (Co) 0.1 mm	POR	Quote
3426	Gold (Au) 0.3 mm	POR	Quote
3427	Gold/palladium (Au/Pd) (80:20) 0.3 mm	POR	Quote
3437	Indium tin oxide (ITO) 3 mm	POR	Quote
3431	Iridium (Ir) 0.3 mm	POR	Quote
3430	Iron (Fe) 0.1 mm	POR	Quote
3539	Magnesium (Mg) 0.5 mm	POR	Quote
3434	Molybdenum (Mo) 0.1 mm	POR	Quote
3428	Platinum (Pt) 0.3 mm	POR	Quote
3425	Platinum/palladium (Pt/Pd) (80:20) 0.3 mm	POR	Quote
3436	Tantalum (Ta) 0.1 mm	POR	Quote
3433	Tin (Sn) 0.1 mm	POR	Quote
3424	Titanium (Ti) 1.5 mm	POR	Quote
3429	Titanium (Ti) 0.5 mm	POR	Quote
3418	Tungsten (W) 0.5 mm	POR	Quote
3420	Tungsten (W) 0.2 mm	POR	Quote

EMS975 Large Chamber Turbo Evaporator & EMS975S for Semiconductor Wafer Coating

The EMS975 Turbo Evaporator is a multiple application system to enable a range of preparation techniques to be applied with the flexibility and module expansion capability to develop new methods and prepare new specimens.

The EMS975 allows for carbon evaporation, metal evaporation from both baskets and crucibles and sputter coating option. A range of techniques can be practiced including carbon support films and replicas for TEM, carbon/metal evaporation, low angle shadowing and sequential layer coating using dual source evaporation and the sputter option can be used for a range of target materials.

The system flexibility is further enhanced by the use of a microcontroller, which readily allows the customer access to a range of options, but readily 'defaults' to optimum operating conditions, allowing both fully automatic and manual override as required. The unique loading rack out drawer system gives the user easy sample access with good sample size and the hinged lid assembly makes any other areas of the system readily accessible.

The unit has a turbo pump, externally mounted for convenience and easy exchange, and is backed up by a Rotary Vacuum Pump. The complete pumping sequence is under fully automatic control, achieving a high vacuum for evaporation.

The unit is bench mounted, with easy to use controls, and cannot be damaged by inadvertent use.

The EMS-975S is based on the EMS-975, however it has a special load lock door which allows the entry of 8" wafers with carbon coating, or other samples up to 140 mm x 140 mm square.

Features

• Turbomolecular Pump
• Automatic pumping sequence
• Clean vacuum
• Variable outgas control
• Evaporation pulse button
• Unique "anti stick" carbon rod gun evaporation assembly (patent pending)
• Rack out drawer sample loading system.
• Rotating plate specimen table with external accurate tilt control (option)
• Large sample capacity,150 mm (6") using drawer with up 200 mm (8") for top loading
• Sample holders range of options, including grid holders, stub holders
• Carbon and Carbon/Platinum evaporation
• Full range vacuum measuring system
• Fast pumping cycle
• Protective Polycarbonate Implosion Shield
• Selectable evaporation supplies giving x 4 evaporation settings
• Restricted or full vent control to avoid disturbances of samples
• Microcontroller with LCD displays of status and customer data entry for control of systems
• Modular electronics
• Bench mounted unit
• Sputter coating (option) for range of metal targets
• Film thickness measurement for carbon and metal depositions

Specifications

Instrument case	450 mm (W) x 500 mm (D) x 300 mm (H).
Weight	65 kg
Work Chamber	Borosilicate Glass 250 mm (Dia.) x 300 mm (H) with hinged top plate (can accommodate samples to 200 mm) (8") in Dia.
Implosion Guard	Polycarbonate – readily removable for maintenance
Carbon source	Adjustable height with tilt control of 0-200°. Uses 6.15 mm Ø carbon rods (source for 3.05 mm Ø carbon rods can be fitted – please specify at time of ordering)
Metal source	Adjustable height with tilt control 0-200°. Supplied with pack of 10 tungsten specimen baskets
Specimen Stage	With tilt facility 0-45°
Vacuum Gauge range	Atm to 1 x 10-7 mbar
Operating Vacuum	Towards 1 x 10-5 mbar, typically achieved within 15 minutes
Low voltage evaporation supply	Pulsed or variable control. Selectable: 0-5V-15V-25V, out-gas current: 0-25A
Services	Nitrogen gas (if used for venting). Argon gas (if the optional sputtering attachment is fitted)
Vacuum pumping	100L/s turbomolecular pump. Requires a 50L/m 'backing' rotary pump with oil mist filter
Electrical supply	230V/50Hz (8A max including pump), 115V/60Hz (16A max including pump)
Supplied with	Accessory kit including: carbon rods (6.15 mm x 100 mm), evaporation filaments, manual rod shaper and operating manual

Ordering Information

91090-C	EMS975 Large Chamber Turbo Evaporator complete with carbon source	POR	Quote
91090-S	EMS975S Turbo Evaporator for Semi Conductor Wafer Coating	POR	Quote
91005	Rotary Vacuum Pump needed to backup the turbo pump	2,900.00	Add to cart

Replacement Source

91077

Carbon Rods (6.15 mm Dia.), 12/pack

59.00

Add to Cart

Replacement Parts

91033	Glass Cylinder	650.00	Add to Cart
91034	"L" Gaskets	400.00	Quote

Optional Accessories

91004-S	EMS105 Aperture Cleaning Head	POR	Quote
92060	EMS190 Low Angle Shadowing	POR	Quote

SEM/TEM Carbon Coaters Techniques and Applications

Sputter Coater Principles

Silver as a Removable Coating for Scanning Electron Microscopy

Dual Head Turbo-Pumped Sputter Coater