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Large Chamber Sputter Coaters


Q300T T Plus Triple Target, Large Chamber, Turbo-Pumped Sputter Coater
The Q300T T Plus is a large chamber, turbo-pumped coating system, ideally suited for sputtering a single large diameter specimen up to 8"/200 mm or multiple smaller specimens over a similar diameter. Ideal for thin-film applications and SEM/FE-SEM. It is fitted with three sputtering heads to ensure even deposition of individual large specimens or multiple specimens.
NB: Please note it is not possible to sequentially sputter three different sputtering metals from each sputtering head – for sequential coating see the Q300T D Plus.
Key Features
- Ultimate vacuum of 1x10-6 mbar or less possible
- New touch and swipe capacitive screen
- USB port for upgrades and download of process log files
- Multiple-use profiles can be set up on one machine
- New software sorts recipes per user according to recent use
- 16GB of memory can store more than 1000 recipes
- New multi-color LED visual status indicator
- Interchangeable stage options
- Three sputter heads for larger area deposition of different materials
Recommended applications for Q300T T Plus
- Wafer Inspection
- Multiple sample preparation for SEM
These products are for Research Use Only.
Detachable chamber with built-in implosion guard
Removable glass chamber and easily accessible base and top plate allows for an easy cleaning process. Users can rapidly change the chamber, if necessary, to avoid cross contamination of sensitive samples. Tall chamber option is available for improved uniformity for sputtering and to hold larger substrates.
Triple Target Sputtering System
The Q300T T Plus is fitted with three individual sputtering heads to ensure even deposition of individual large specimens or multiple specimens. For economical coating of small specimens, 'single target' mode can be selected. They are ideal coaters for the preparation of large specimens for examination by SEM, FEG-SEM. To ensure even deposition, the Q300T T Plus coaters are fitted with a rotating specimen stage and three individual magnetron target assemblies, which enhance the efficiency of the process by using low voltages.
Multiple stage options
The Q300T T Plus has specimen stages to meet most requirements. All are easy-change, drop-in style (no screws) and the rotation speed is variable between pre-set limits. Flat rotation stage for 200 mm/8" and 150 mm/6" wafers (fitted as standard).
Safety
The Q300T T Plus meets key industry CE standards
- All electronic components are protected by covers
- Implosion guard prevents user injury in event of chamber failure
- Vacuum interlocks remove power from deposition sources to prevent user exposure to high voltage in event of chamber being opened
- Overheating protection shuts down power supply
Vacuum control
High vacuum turbo pumping allows sputtering of a wide range of oxidizing and non-oxidizing metals for thin film and electron microscopy applications. Automatic vacuum control which can be pre-programmed to suit the process and material, therefore removing the need for manual intervention or control.
Cool magnetron sputtering
Sputter coating is a technique widely used in various applications; it is possible to create a plasma and sputter metals with high voltage, poor vacuum and no automation. However, this is not suitable for electron microscopy applications because it can heat the sample and result in damage when the plasma interacts with the sample. The Q300T T Plus uses low temperature enhanced-plasma magnetrons optimized for the turbomolecular pump pressures, combined with low current and deposition control, which ensures your sample is protected and uniformly coated.
The Q300T T Plus uses easy-change, 57 mm diameter, disc-style targets which are designed to sputter oxidizing and noble metals. The Q300T T Plus is fitted as standard with a chromium (Cr) sputter target. Other targets options include; Au, Au/Pd, Pt/Pd, Pd, Pt, Cu, Ir, W, ITO and Al, etc.
Pulsed cleaning for Aluminum sputtering
Aluminum (Al) rapidly forms an oxide layer which can be difficult to remove. The Q300T T Plus has a special recipe for Aluminum that reduces the oxide removal time and prevents excessive pre-sputtering of the target.
Film thickness monitor
The Q300T T Plus can be fitted with an optional film thickness monitor (FTM), which measures the coating thickness on a quartz crystal monitor within the chamber, in order to control the coating thickness of material deposited on to the sample.
Specifications
Instrument case | 590 mm W x 535 mm D x 420 mm H, total height with coating head open is 772 mm |
Weight | 36 kg (Packed 59 kg) |
Packed dimensions | 730 mm W x 630 mm D x 690 mm H |
Work chamber | Borosilicate glass 300 mm OD x 127 mm H |
Safety shield | Integral polyethylene terephthalate (PET) cylinder |
Display | 115.5 mm W x 86.4 mm H (active area), 640 RGB x 480 (display format), capacitive touch color display |
User interface | Full graphical interface with touch screen buttons, includes features such as a log of the last 1000 coatings and reminders for when maintenance is due |
Specimen stage | A flat rotation stage for 6" (150 mm) and 8" (200 mm) wafers is fitted as standard. A rotating/tilt stage and the 'rota cota' rotary tilt stage are also options |
Vacuum
Rotary pump | 4m3/hr two-stage rotary pump with oil mist filter for the Q300T T Plus |
Turbo pump | Internally mounted 70 L/s air-cooled |
Vacuum measurement | Pirani gauge as standard, full range gauge available as an option |
Ultimate Vacuum | 5 x 10-5 mbar Typical ultimate vacuum of the pumping system in a clean instrument after pre-pumping and venting with dry nitrogen gas |
Sputter vacuum range | 5 x 10-2 mbar to 5 x 10-3 mbar Typical ultimate vacuum of the pumping system in a clean instrument after pre-pumping and venting with dry nitrogen gas |
Processes
Sputter Deposition Current | Single target: 1 – 140mA All targets: 60 – 420mA |
Services
Gases | Process gas argon, 99.999% Nominal 5 psi |
Visual status indicator
A large multi-color status indicator light provides a visual indication of the state of the equipment, allowing users to easily identify the status of a progress at a distance.
The indicator LED shows the following states:
- Initialization
- Process running
- Idle
- Coating in progress
- Process completed
- Process ended in fault condition
Audio indication also sounds on completion of the process.
Ordering Information
Q300T T Plus | Triple Target, Large Chamber, Turbo-Pumped Sputter Coater, fitted with three sputtering heads to ensure even metal deposition. Includes three 57 mm Ø x 0.3 mm chromium (Cr) sputter targets. A flat rotation stage for 200 mm/8" and 150 mm/6" wafers is fitted as standard. | POR | Quote |
Rotary pump requirements (needs to be ordered separately)
91003 | Edwards RV3 50L/s two-stage rotary pump, with vacuum hose, coupling kit and oil mist filter | 2,700.00 | Add to Cart |
6548 | XDS 5 Scroll Pump | POR | Quote |
6550-A | Diaphragm pump. A "dry" alternative to the standard 91003 oil-based rotary pump complete with vacuum hose, coupling kit and oil mist filter | POR | Quote |
Specimen stages
6551 | Rotating 50 mm Ø specimen stage with adjustable tilt. The platform has six specimen stub positions for 15 mm, 10 mm, 6.5 mm or ⅛" pin stubs. Stage rotation speed is variable between preset limits. No rotation when in single target mode. Target to stage height is variable between zero and 42 mm for the standard stage. When used with the extended height cylinder (optional accessory) the target to stage height would be an additional 87 mm | POR | Quote |
6552 | 50 mm Ø variable height specimen stage with six stub positions for 15 mm, 10 mm, 6.5 mm disc stubs or ⅛" pin stubs. Stage rotation speed variable between preset limits | POR | Quote |
6553 | 50 mm Ø "Rotacota" stage. A rotary planetary style stage with variable tilt angle from horizontal to 30 degrees. The platform has six positions for either, 6.5 mm, 10 mm, 15 mm disc stubs, or ⅛" pin stubs. Rotation speed is variable between preset limits. Note: depending upon specimen height, this stage may require the optional extended height cylinder | POR | Quote |
6554 | A 90 mm Ø specimen stage for glass microscope slides (up to two 75 mm x 25 mm slides or a single 75 mm x 50 mm slide). The stage can alternatively accommodate up to six ⅛" SEM pins stub. Stage rotation speed is variable between preset limits. Includes gear box to allow optional FTM to be used. | POR | Quote |
6547 | 6" Wafer Specimen Stage: A flat adjustable stage capable of accepting 6" or 101.6 mm wafers | POR | Quote |
6549 | A 4" 102 mm flat drop-in-wafer stage which accepts 2", 3", and 4" wafers | POR | Quote |
Options and Accessories
6555 | Film thickness monitor (FTM) attachment. Including oscillator, feed-through, quartz crystal holder and one quartz crystal | POR | Quote |
6556 | Spare quartz crystal | 95.00 | Add to Cart |
6557 | Extended height vacuum chamber (214 mm in height – the standard chamber is 127 mm high). For increased source to specimen distance and for coating large specimens | POR | Quote |
6558 | A lockable emergency stop (e-stop) switch which can be mounted on top of the system in a position easily accessible for the operator. It is provided with a key to release the knob after activation. Note: the addition of the e-stop does not inhibit or replace the normal On/Off switch function. The e-stop can be retrofitted to existing systems | POR | Quote |
6559 | Coating shields. Shields can be fitted to protect large surfaces from coating deposition – easily removable for ease of cleaning | POR | Quote |
6560-A | Vacuum spigot allows more convenient connection of the vacuum hose to the rear of the Q300T T Plus when bench depth is limited | POR | Quote |
6561 | Full range, active vacuum gauge capable of measurement over the range of 1000 mbar to 5 x 10-9 mbar. Typical ultimate vacuum of system is 5 x 10-5 mbar. Note: gauge must be factory fitted | POR | Quote |
6562 | Spares kit, including: spare standard glass cylinder, three 3417 chromium (Cr) sputtering targets, vacuum tubing with coupling insert, argon gas tubing, three sputter head magnets, rotary pump oil mist filter and fuses | POR | Quote |
Sputter targets
Note: The Q300T T Plus is fitted as standard with three 0.3 mm chromium (Cr) targets (3417). Other optional targets are available (three required):
3410 | 57 mm Ø x 0.1 mm Gold | POR | Quote |
3410-2 | 57 mm Ø x 0.2 mm Gold | POR | Quote |
3411 | 57 mm Ø x 0.1 mm Gold/Palladium (80/20) | POR | Quote |
3411-2 | 57 mm Ø x 0.2 mm Gold/Palladium (80/20) | POR | Quote |
3412 | 57 mm Ø x 0.1 mm Platinum | POR | Quote |
3412-2 | 57 mm Ø x 0.2 mm Platinum | POR | Quote |
3413 | 57 mm Ø x 0.1 mm Nickel | POR | Quote |
3414 | 57 mm Ø x 0.1 mm Silver | POR | Quote |
3415 | 57 mm Ø x 0.1 mm Palladium | POR | Quote |
3416 | 57 mm Ø x 0.1 mm Copper | POR | Quote |
3417 | 57 mm Ø x 0.3 mm Chromium | POR | Quote |
3418 | 57 mm Ø x 0.5 mm Tungsten | POR | Quote |
3419 | 57 mm Ø x 1.5 mm Chromium | POR | Quote |
3420 | 57 mm Ø x 0.2 mm Tungsten | POR | Quote |
3421 | 54 mm Ø x 1.5 mm Carbon | POR | Quote |
3422 | 57 mm Ø x 0.1 mm Aluminum | POR | Quote |
3423 | 57 mm Ø x 0.1 mm Platinum/Palladium (80/20) | POR | Quote |
3424 | 57 mm Ø x 1.5 mm Titanium | POR | Quote |
3425 | 57 mm Ø x 0.3 mm Platinum/Palladium (80/20) | POR | Quote |
3426 | 57 mm Ø x 0.3 mm Gold | POR | Quote |
3427 | 57 mm Ø x 0.3 mm Gold/Palladium (80/20) | POR | Quote |
3428 | 57 mm Ø x 0.3 mm Platinum | POR | Quote |
3429 | 57 mm Ø x 0.5 mm Titanium | POR | Quote |
3430 | 57 mm Ø x 0.1 mm Iron | POR | Quote |
3431 | 57 mm Ø x 0.3 mm Iridium | POR | Quote |
3432 | 57 mm Ø x 0.1 mm Cobalt | POR | Quote |
3433 | 57 mm Ø x 0.1 mm Tin | POR | Quote |
3434 | 57 mm Ø x 0.1 mm Molybdenum | POR | Quote |
3435 | 57 mm Ø x 0.3 mm Magnesium | POR | Quote |
3435-5 | 57 mm Ø x 0.5 mm Magnesium | POR | Quote |
3436 | 57 mm Ø x 0.1 mm Tantalum | POR | Quote |
3437 | 57 mm Ø x 3 mm Indium Tin Oxide (90/10) | POR | Quote |

Q300T ES Large Chamber Turbo-Pumped Evaporator/Sputter Coater
The Q300T ES is a large chamber, turbomolecular-pumped coating system ideally suited to metal evaporation onto large diameter specimens up to 6"/152 mm (for example a wafer) or smaller multiple specimens. The Q300T ES also comes with interchangeable sputtering and carbon evaporation inserts to allow a coating radius of up to 4"/102 mm.
Key Features
- Metal evaporation, carbon evaporation and metal sputtering – in one space saving design
- Larger area metal evaporation – up to 6"/152 mm
- Larger area sputter/carbon coating – up to 4"/102 mm diameter
- High vacuum sputtering – oxidizing and non-oxidizing (noble) metals: suitable for SEM, high resolution FE-SEM and many thin film applications
- High vacuum carbon coater – ideal for SEM and TEM carbon coating
- Controlled, ramped carbon rod evaporation – precise control of carbon thickness. Non-sparking process gives superior quality films
- Up to 60 minutes sputtering time – thick films capabilities
- Three-Year Warranty



The Q300T ES is a large chamber, turbomolecular-pumped coating system ideally suited to metal evaporation onto large diameter specimens up to 6"/152 mm (for example a wafer) or smaller multiple specimens. The Q300T ES also comes with interchangeable sputtering and carbon evaporation inserts to allow a coating radius of up to 4"/102 mm.
The sputter coating insert will deposit both oxidizing metals, e.g. chromium and Aluminum and non-oxidizing (noble) metals such as gold and platinum. A chromium (Cr) target is fitted as standard.
The Q300T ES has a full range of optional accessories, including specimen stages and film thickness measurement which means the system can be tailored to the precise requirements of the user.
Thermal evaporation of metals
The Q300T ES allows controlled thermal evaporation of metals onto large substrates (up to 6"/152 mm). For many evaporative processes, tungsten filaments supplied with the system are used. However, some metals require the use of a molybdenum boat, which can also be used for heat-cleaning SEM and TEM apertures.
The evaporation head is normally positioned for downwards evaporation, but for small specimens upward evaporation is possible using two terminal extensions supplied with the system.
Sputter coating for high resolution FE-SEM and thin film applications
The advance design of sputtering head, power supply and system control allows sputtering of both oxidizing and non-oxidizing (noble) metals for thin film applications and for scanning electron microscopy (SEM) coating. The full range of target materials available is extensive and detailed in the Ordering Information section.
For sputtering applications where thick films are required, then the Q300T ES can operate for up to 60 minutes.
High vacuum carbon evaporation for SEM and TEM
The carbon rod evaporation insert allows high quality carbon films to be deposited over a radius of up to 4"/102 mm.
The Q300T ES uses controlled ramped carbon rod evaporation to ensure optimum control of the process and quality of results (with or without the optional film thickness measurement system). In addition the quality of the resulting carbon films is enhanced by the eradication of "sparking" which is a common problem with less advanced coating systems.

High vacuum turbomolecular pumping and vacuum measurement
The Q300T ES is fitted with an internally mounted 70 L/s turbomolecular pump backed by a 5m3 hr two-stage rotary pump (order separately). A full range vacuum measurement gauge is included. Typically ultimate vacuums of around 5 x 10-5 mbar can be expected in a clean system after pre-pumping with dry nitrogen gas. For details of pumping options, see Ordering Information.
Touch-screen control and stored recipes
At the operational heart of the Q300T ES is a color touch screen which allows users to rapidly enter and store their own process data. A range of typical sputtering and evaporation profiles are pre-installed. The Q300T ES uses an 'Intelligent' recognition system that automatically detects the type of coating insert fitted and "becomes" either an evaporator, carbon coater or sputter coater.
Vacuum chamber and specimen stages
The Q300T ES is presented in a custom-molded, one-piece case allowing easy servicing access. The case houses all the working components and includes an automatic bleed control that ensures optimum vacuum conditions during sputtering.
The vacuum chamber has an internal diameter of 283 mm/11" and comes with an integral safety guard. The vacuum shutdown option enhances vacuum performance by allowing the chamber vacuum to be maintained when the coater is not in use.
A variable speed rotary specimen stage is fitted as standard and accommodates specimens up to 4"/100 mm in diameter. For details of other stages, see Ordering Information.
Pumping Requirement
A suitable rotary vacuum pump is required. The Pfeiffer DUO 6 5m3/hr two-stage rotary vacuum pump (91003) is ideal for this purpose. Dry pumping alternatives are also available. See Ordering Information for more details.
Options and Accessories
Specimen stages and holders
The Q300T ES has additional specimen stages to meet most requirements. All are easy-change, drop-in style (no screws) and are height adjustable (except for the rotary planetary stage). Rotation speeds are variable between preset limits.
- Rotation stage for 4" wafers (supplied with system)
- Rotation stage for 6" wafers
- Flat rotation stage for SEM specimen stubs
- Rotation stage with preset tilt for SEM specimen stubs
- Rotate-tilt (rotary-planetary style) stage
- Rotation stage for glass microscope slides
- Eight-place stage for 25 mm or 30 mm embedded polished specimens
- "Sun and planets" style rotary stage; Three platforms, each 92 mm Ø
- Microscope coverslip stage for nine 20 mm x 20 mm coverslips
- TEM grid holder
Other options
- Extended height chamber (supplied with the Q300T ES)
- Standard height chamber
- Film thickness monitor (FTM)
- Conductance film monitor (CFM)
Specifications
Dimensions | 585 mm W x 470 mm D x 410 mm H, total height with coating head open is 710 mm |
Weight | 37 kg |
Packed dimensions | 725 mm W x 660 mm D x 680 mm H (45 kg) |
Work chamber | Borosilicate glass 283 mm ID x 215 mm H |
User interface | Intuitive full graphical interface with touch-screen menus and buttons |
Sputter target | Disc-style 57 mm Ø with thickness depending upon the target fitted. One 0.3 mm thick chromium (Cr) target (3417) is fitted as standard |
Pumping | Internally-mounted 70 L/s turbomolecular pump |
Rotary pump | 5m3 hr two-stage rotary pump with oil mist filter. (Order separately: see 91003). Dry pumping option available. |
Typical ultimate vacuum | 5 x 10-5 mbar in a clean system after pre-pumping with dry nitrogen gas. Measurement using a full range Penning gauge |
Specimen stage | Stage for 4" wafer supplied as standard. For alternative stages, see Ordering Information |
Services and other Information
Gases | Argon sputtering process gas, 99.999%. Nitrogen venting gas (optional) |
Electrical supply | 90-250 V 50/60 Hz 1,400 VA including rotary pump, 110/240 V voltage selectable |
Ordering Information
Q300T ES | Turbomolecular-pumped sputtering, metal evaporation and carbon coating system with 300 mm Ø x 215 H mm work chamber. Consists of high quick release sputter insert with a 3417 57 mm Ø x 0.3 mm chromium (Cr) target. High vacuum carbon rod evaporation coater and metal evaporation head. Coating inserts are interchangeable. A 4" wafer stage supplied as standard. Integrated full range gauge assembly for high vacuum measurement. | POR | Quote |
Rotary pump requirements – order separately
Pumps supplied with vacuum hose and coupling kit
91003 | 5m3 hr two-stage Pfeiffer Duo 6 rotary pump with oil mist filter | 2,700.00 | Add to Cart |
6550-A | Diaphragm pump. A "dry" alternative to the standard 91003 oil-based rotary pump | POR | Quote |
6548 | Edwards nXDS6i scroll pump. Lubricant-free and hermetically sealed, giving totally clean and dry vacuum to prevent cross-contamination | POR | Quote |
Options and Accessories – specimen stages
Rotation stages rotation speed variable between preset limits
6551 | Rotating 50 mm Ø specimen stage with adjustable tilt. The platform has six specimen stub positions for 15 mm, 10 mm, 6.5 mm or ⅛" pin stubs. Stage rotation speed is variable between preset limits. No rotation when in single target mode. Target to stage height is variable between zero and 42 mm for the standard stage. When used with the extended height cylinder (optional accessory 10596) the target to stage height would be an additional 87 mm | POR | Quote |
6552 | 50 mm Ø variable height specimen stage with six stub positions for 15 mm, 10 mm, 6.5 mm disc stubs or ⅛" pin stubs. Stage rotation speed variable between preset limits | POR | Quote |
6553 | 50 mm Ø rotary tilting stage. A rotary planetary style stage with variable tilt angle from horizontal to 30 degrees. The platform has six positions for either, 6.5 mm, 10 mm, 15 mm disc stubs, or ⅛" pin stubs. Rotation speed is variable between preset limits. Note: depending upon specimen height, this stage may require the optional extended height cylinder | POR | Quote |
6554 | A 90 mm Ø specimen stage for glass microscope slides (up to two 75 mm x 25 mm slides or a single 75 mm x 50 mm slide). The stage can alternatively accommodate up to six ⅛" SEM pins stub. Stage rotation speed is variable between preset limits. Includes gear box to allow optional FTM to be used. | POR | Quote |
6547-SP | Rotation stage for 4" or 6" wafers | POR | Quote |
6513 | Sun and planet-style rotation stage (each stage is 92 mm Ø) | POR | Quote |
6549 | Eight-place stage for 25 or 30 mm embedded, polished specimens | POR | Quote |
6512 | Nine-place TEM grid holder | POR | Quote |
Other Options and Accessories
6555 | Film thickness monitor (FTM) attachment. Including oscillator, feed-through, quartz crystal holder and one quartz crystal | POR | Quote |
6556 | Spare quartz crystal for FTM | 95.00 | Add to Cart |
6555-SP | Conductance film monitor (CFM) attachment including housing, feedthrough, glass slides and cable. A factory fitted only option for monitoring sheet resistance of evaporated films allowing termination at a known resistance | POR | Quote |
6557 | Extended height glass cylinder, 300 mm Ø x 215 mm high (supplied as standard) | POR | Quote |
6557-10 | Standard height glass cylinder, 300 mm Ø x 127 mm high | POR | Quote |
6558 | A lockable emergency stop (e-stop) switch mounted on top of the system for easy access | POR | Quote |
6559 | Coating shields. Can be fitted to protect large surfaces in the chamber from coating deposition – easily removable for ease of cleaning | POR | Quote |
6560-A | Vacuum spigot allows a more convenient connection of the vacuum hose to the rear of the Q300T ES when bench depth is limited | POR | Quote |
Evaporation Supplies
73830-SP | Tungsten wire baskets – pack of 10 | POR | Quote |
73810-SP | Molybdenum boats – pack of 10 | POR | Quote |
Sputter Targets
All targets are 57 mm in diameter – thicknesses vary. The Q300T ES is fitted as standard with one 57 mm x 0.3 mm chromium (Cr) target. Other optional targets are available:
3410 | Gold (Au) 0.1 mm | POR | Quote |
4524 | Gold (Au) 0.2 mm | POR | Quote |
3411 | Gold/palladium (Au/Pd) 0.1 mm | POR | Quote |
4527 | Gold/palladium (Au/Pd) 0.2 mm | POR | Quote |
3412 | Platinum (Pt) 0.1 mm | POR | Quote |
4530 | Platinum (Pt) 0.2 mm | POR | Quote |
3413 | Nickel (Ni) 0.1 mm | POR | Quote |
3414 | Silver (Ag) 0.1 mm | POR | Quote |
3415 | Palladium (Pd) 0.1 mm | POR | Quote |
3416 | Copper (Cu) 0.1 mm | POR | Quote |
3538 | Aluminum (Al) 1.0 mm | POR | Quote |
3421 | Carbon (C) 1.5 mm | POR | Quote |
3417 | Chromium (Cr) 0.3 mm | POR | Quote |
3419 | Chromium (Cr) 1.5 mm | POR | Quote |
3432 | Cobalt (Co) 0.1 mm | POR | Quote |
3426 | Gold (Au) 0.3 mm | POR | Quote |
3427 | Gold/palladium (Au/Pd) (80:20) 0.3 mm | POR | Quote |
3437 | Indium tin oxide (ITO) 3 mm | POR | Quote |
3431 | Iridium (Ir) 0.3 mm | POR | Quote |
3430 | Iron (Fe) 0.1 mm | POR | Quote |
3539 | Magnesium (Mg) 0.5 mm | POR | Quote |
3434 | Molybdenum (Mo) 0.1 mm | POR | Quote |
3428 | Platinum (Pt) 0.3 mm | POR | Quote |
3425 | Platinum/palladium (Pt/Pd) (80:20) 0.3 mm | POR | Quote |
3436 | Tantalum (Ta) 0.1 mm | POR | Quote |
3433 | Tin (Sn) 0.1 mm | POR | Quote |
3424 | Titanium (Ti) 1.5 mm | POR | Quote |
3429 | Titanium (Ti) 0.5 mm | POR | Quote |
3418 | Tungsten (W) 0.5 mm | POR | Quote |
3420 | Tungsten (W) 0.2 mm | POR | Quote |